Characterization of hydrogenated amorphous silicon (a-Si:H) film stacks for deep submicron fuse link applications

Characterization of hydrogenated amorphous silicon (a-Si:H) film stacks for deep submicron fuse link applications

In the first part of the project, the characteristics of Plasma Enhanced Chemical Vapour Deposition (PECVD) ct-Si:H films deposited using pure Silane plasma and Silane plasma diluted with Argon under different deposition conditions were investigated in terms of the deposition rate, hydrogen content,...

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Bibliographic Details
Main Author: Ang, Ting Cheong
Other Authors: Tse, Man Siu
Format: Thesis
Language:English
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
DRNTU::Engineering::Materials::Material testing and characterization
Online Access:http://hdl.handle.net/10356/13363

Internet

http://hdl.handle.net/10356/13363

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