Direct simulation Monte Carlo method of deposition processes

Direct simulation Monte Carlo method of deposition processes

Modifications had been done on the basic DSMC2.fortran program developed by G. A. Bird to approximate the initial deposition profile characteristic of a physical vapor deposition process, whereby little or no surface chemical reaction occurs. In this report, initial deposition growth of PVD Aluminum...

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Bibliographic Details
Main Author: Tan, Chee Hong.
Other Authors: Zhao, Yong
Format: Thesis
Language:English
Published: 2008
Subjects:
DRNTU::Engineering::Computer science and engineering::Computing methodologies::Simulation and modeling
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:http://hdl.handle.net/10356/13523

Internet

http://hdl.handle.net/10356/13523

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