Cyclic scheduling analysis of single-arm cluster tools with wafer residency time constraint and chamber cleaning operations
In semiconductor manufacturing, a cleaning operation that takes significant time is required for eliminating the chemical residual in a chamber after a wafer being processed and removed from it. Such a cleaning operation makes a traditional backward strategy inefficient. In the existing work, it is...
| Main Authors: | , , , |
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| Other Authors: | |
| Format: | Conference Paper |
| Language: | English |
| Published: |
2020
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/140220 |