Electron radiation-induced material diffusion and nanocrystallization in nanostructured amorphous CoFeB thin film

Electron radiation-induced material diffusion and nanocrystallization in nanostructured amorphous CoFeB thin film

Transmission electron microscopy (TEM) is widely used for physical characterization of CoFeB based magnetic tunneling junctions (MTJ) with its atomic-scale resolution. However, highly energetic electron radiation during TEM analysis may cause phase and microstructure modification of CoFeB and its as...

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Bibliographic Details
Main Authors: Liu, Binghai, Tahmasebi, Taiebeh, Ong, Kenny, Teo, Hanwei, Mo, Zhiqiang, Lam, Jeffrey, Tan, Pik Kee, Zhao, Yuzhe, Dong, Zhili, Houssameddine, Dimitri, Wang, Jacob, Xue, Junming, Mai, Zhihong
Other Authors: School of Materials Science and Engineering
Format: Journal Article
Language:English
Published: 2020
Subjects:
Engineering::Materials
Electron Beam Radiation
Transmission Electron Microscopy
Online Access:https://hdl.handle.net/10356/143601

Internet

https://hdl.handle.net/10356/143601

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