A novel fabrication technique for three-dimensional concave nanolens arrays

A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to...

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Detalhes bibliográficos
Principais autores: Duan, Tianli, Xu, Kang, Liu, Zhihong, Gu, Chenjie, Pan, Jisheng, Ang, Diing Shenp, Zhang, Rui, Wang, Yao, Ma, Xuhang
Outros Autores: School of Electrical and Electronic Engineering
Formato: Journal Article
Idioma:English
Publicado em: 2020
Assuntos:
Acesso em linha:https://hdl.handle.net/10356/145437