A novel fabrication technique for three-dimensional concave nanolens arrays
A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to...
| Principais autores: | , , , , , , , , |
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| Outros Autores: | |
| Formato: | Journal Article |
| Idioma: | English |
| Publicado em: |
2020
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| Assuntos: | |
| Acesso em linha: | https://hdl.handle.net/10356/145437 |