A novel fabrication technique for three-dimensional concave nanolens arrays
A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to...
| Main Authors: | , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2020
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/145437 |
| _version_ | 1826119231107760128 |
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| author | Duan, Tianli Xu, Kang Liu, Zhihong Gu, Chenjie Pan, Jisheng Ang, Diing Shenp Zhang, Rui Wang, Yao Ma, Xuhang |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Duan, Tianli Xu, Kang Liu, Zhihong Gu, Chenjie Pan, Jisheng Ang, Diing Shenp Zhang, Rui Wang, Yao Ma, Xuhang |
| author_sort | Duan, Tianli |
| collection | NTU |
| description | A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to accumulate at the edge of the PMMA resist helps create a local electric field that causes the ions to etch the sidewall of the PMMA resist. This process progressively increases the uncovered area, resulting in a graded etched depth or a concave structure in the substrate. In addition, using a given ICP etching recipe, the time required for a PMMA resist to be removed by sidewall etching is determined by its width. The use of PMMA resist of different widths enables one to achieve structures of varying etched depths and thus a 3D lens array. Optical characteristics of the fabricated nanolens were simulated using the FDTD (Finite-difference time-domain) method, and focal lengths ranging from 150 nm to 420 nm were obtained. This type of nanolens is very useful in ultraviolet optical devices and CMOS image sensors. |
| first_indexed | 2024-10-01T04:56:48Z |
| format | Journal Article |
| id | ntu-10356/145437 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T04:56:48Z |
| publishDate | 2020 |
| record_format | dspace |
| spelling | ntu-10356/1454372020-12-21T08:59:20Z A novel fabrication technique for three-dimensional concave nanolens arrays Duan, Tianli Xu, Kang Liu, Zhihong Gu, Chenjie Pan, Jisheng Ang, Diing Shenp Zhang, Rui Wang, Yao Ma, Xuhang School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering Concave Nanolens Three-dimensional Lens Array A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to accumulate at the edge of the PMMA resist helps create a local electric field that causes the ions to etch the sidewall of the PMMA resist. This process progressively increases the uncovered area, resulting in a graded etched depth or a concave structure in the substrate. In addition, using a given ICP etching recipe, the time required for a PMMA resist to be removed by sidewall etching is determined by its width. The use of PMMA resist of different widths enables one to achieve structures of varying etched depths and thus a 3D lens array. Optical characteristics of the fabricated nanolens were simulated using the FDTD (Finite-difference time-domain) method, and focal lengths ranging from 150 nm to 420 nm were obtained. This type of nanolens is very useful in ultraviolet optical devices and CMOS image sensors. Published version 2020-12-21T08:59:20Z 2020-12-21T08:59:20Z 2020 Journal Article Duan, T., Xu, K., Liu, Z., Gu, C., Pan, J., Ang, D. S., . . . Ma, X. (2020). A novel fabrication technique for three-dimensional concave nanolens arrays. Journal of Materiomics, 6(3), 557-562. doi:10.1016/j.jmat.2020.04.003 2352-8478 https://hdl.handle.net/10356/145437 10.1016/j.jmat.2020.04.003 3 6 557 562 en Journal of Materiomics © 2020 The Chinese Ceramic Society. Production and hosting by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/). application/pdf |
| spellingShingle | Engineering::Electrical and electronic engineering Concave Nanolens Three-dimensional Lens Array Duan, Tianli Xu, Kang Liu, Zhihong Gu, Chenjie Pan, Jisheng Ang, Diing Shenp Zhang, Rui Wang, Yao Ma, Xuhang A novel fabrication technique for three-dimensional concave nanolens arrays |
| title | A novel fabrication technique for three-dimensional concave nanolens arrays |
| title_full | A novel fabrication technique for three-dimensional concave nanolens arrays |
| title_fullStr | A novel fabrication technique for three-dimensional concave nanolens arrays |
| title_full_unstemmed | A novel fabrication technique for three-dimensional concave nanolens arrays |
| title_short | A novel fabrication technique for three-dimensional concave nanolens arrays |
| title_sort | novel fabrication technique for three dimensional concave nanolens arrays |
| topic | Engineering::Electrical and electronic engineering Concave Nanolens Three-dimensional Lens Array |
| url | https://hdl.handle.net/10356/145437 |
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