A novel fabrication technique for three-dimensional concave nanolens arrays
A novel facile technique is proposed for fabricating three-dimensional (3D) concave nanolens arrays on a silicon substrate. The technique leverages an inherent characteristic of the polymethyl methacrylate (PMMA) resist during inductively coupled plasma (ICP) etching. The tendency for plasma ions to...
Main Authors: | Duan, Tianli, Xu, Kang, Liu, Zhihong, Gu, Chenjie, Pan, Jisheng, Ang, Diing Shenp, Zhang, Rui, Wang, Yao, Ma, Xuhang |
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Other Authors: | School of Electrical and Electronic Engineering |
Format: | Journal Article |
Language: | English |
Published: |
2020
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/145437 |
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