A high-bandwidth end-effector with active force control for robotic polishing
To promote operational intelligence, improve surface quality, and reduce manpower dependence, a novel high-bandwidth end-effector with active force control for robotic polishing was proposed. Using this end-effector as a mini robot, a macro-mini robot for polishing processing was constructed, in whi...
Main Authors: | , , , , , , , , |
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Format: | Journal Article |
Language: | English |
Published: |
2021
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Online Access: | https://hdl.handle.net/10356/145812 |
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author | Li, Jian Guan, Yisheng Chen, Haowen Wang, Bing Zhang, Tao Liu, Xineng Hong, Jie Wang, Danwei Zhang, Hong |
author2 | School of Electrical and Electronic Engineering |
author_facet | School of Electrical and Electronic Engineering Li, Jian Guan, Yisheng Chen, Haowen Wang, Bing Zhang, Tao Liu, Xineng Hong, Jie Wang, Danwei Zhang, Hong |
author_sort | Li, Jian |
collection | NTU |
description | To promote operational intelligence, improve surface quality, and reduce manpower dependence, a novel high-bandwidth end-effector with active force control for robotic polishing was proposed. Using this end-effector as a mini robot, a macro-mini robot for polishing processing was constructed, in which the macro robot provides posture control during polishing operations, whereas the mini-robot provides constant force control. By minimizing the inertia along the spindle in this configuration, the end-effector obtains a force control bandwidth of 200 Hz. Through a series of comparative experiments with different contact forces and feed rates, the proposed design was proven to have a smaller overshoot, a faster response, and a shorter settling time than the conventional method based on macro robot (KUKA iiwa) controlled force. The roughness of the workpiece reached $0.4~\mu \text{m}$ after polishing with the macro-mini robot, indicating the efficiency of this end-effector in high-precision material removal and surface polishing operations. |
first_indexed | 2024-10-01T05:39:01Z |
format | Journal Article |
id | ntu-10356/145812 |
institution | Nanyang Technological University |
language | English |
last_indexed | 2024-10-01T05:39:01Z |
publishDate | 2021 |
record_format | dspace |
spelling | ntu-10356/1458122021-01-08T08:36:38Z A high-bandwidth end-effector with active force control for robotic polishing Li, Jian Guan, Yisheng Chen, Haowen Wang, Bing Zhang, Tao Liu, Xineng Hong, Jie Wang, Danwei Zhang, Hong School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering Robotic Polishing Force Control To promote operational intelligence, improve surface quality, and reduce manpower dependence, a novel high-bandwidth end-effector with active force control for robotic polishing was proposed. Using this end-effector as a mini robot, a macro-mini robot for polishing processing was constructed, in which the macro robot provides posture control during polishing operations, whereas the mini-robot provides constant force control. By minimizing the inertia along the spindle in this configuration, the end-effector obtains a force control bandwidth of 200 Hz. Through a series of comparative experiments with different contact forces and feed rates, the proposed design was proven to have a smaller overshoot, a faster response, and a shorter settling time than the conventional method based on macro robot (KUKA iiwa) controlled force. The roughness of the workpiece reached $0.4~\mu \text{m}$ after polishing with the macro-mini robot, indicating the efficiency of this end-effector in high-precision material removal and surface polishing operations. Published version 2021-01-08T08:36:38Z 2021-01-08T08:36:38Z 2020 Journal Article Li, J., Guan, Y., Chen, H., Wang, B., Zhang, T., Liu, X., . . . Zhang, H. (2020). A high-bandwidth end-effector with active force control for robotic polishing. IEEE Access, 8, 169122-169135. doi:10.1109/ACCESS.2020.3022930 2169-3536 https://hdl.handle.net/10356/145812 10.1109/ACCESS.2020.3022930 8 169122 169135 en IEEE Access © 2020 IEEE. This journal is 100% open access, which means that all content is freely available without charge to users or their institutions. All articles accepted after 12 June 2019 are published under a CC BY 4.0 license, and the author retains copyright. Users are allowed to read, download, copy, distribute, print, search, or link to the full texts of the articles, or use them for any other lawful purpose, as long as proper attribution is given. application/pdf |
spellingShingle | Engineering::Electrical and electronic engineering Robotic Polishing Force Control Li, Jian Guan, Yisheng Chen, Haowen Wang, Bing Zhang, Tao Liu, Xineng Hong, Jie Wang, Danwei Zhang, Hong A high-bandwidth end-effector with active force control for robotic polishing |
title | A high-bandwidth end-effector with active force control for robotic polishing |
title_full | A high-bandwidth end-effector with active force control for robotic polishing |
title_fullStr | A high-bandwidth end-effector with active force control for robotic polishing |
title_full_unstemmed | A high-bandwidth end-effector with active force control for robotic polishing |
title_short | A high-bandwidth end-effector with active force control for robotic polishing |
title_sort | high bandwidth end effector with active force control for robotic polishing |
topic | Engineering::Electrical and electronic engineering Robotic Polishing Force Control |
url | https://hdl.handle.net/10356/145812 |
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