Fabrication of zinc substrate encapsulated by fluoropolyurethane and its drag-reduction enhancement by chemical etching
A fluoropolyurethane-encapsulated process was designed to rapidly fabricate low-flow resistance surfaces on the zinc substrate. For the further enhancement of the drag-reduction effect, Cu2+-assisted chemical etching was introduced during the fabrication process, and its surface morphology, wettabil...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2021
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/146050 |