Atomic layer deposition of Pd and Pt thin films with ozone

There has been a rising trend in miniaturisation of devices, which leads to an increase in demand for thin and ultrathin films. There are several techniques to deposit thin films, one of which is Atomic Layer Deposition (ALD), which has been growing in popularity in recent times. ALD can deposit thi...

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Bibliographic Details
Main Author: Aw, Jin Yan
Other Authors: Alfred Tok Iing Yoong
Format: Final Year Project (FYP)
Language:English
Published: Nanyang Technological University 2021
Subjects:
Online Access:https://hdl.handle.net/10356/147662