Formation of germanium (Ge) – based waveguides for infrared application

Germanium-tin (Ge0.9Sn0.1) alloy is one of the complementary metal-oxide-semiconductor (CMOS) compatible materials in group-IV of the periodic table. Due to the large lattice mismatch between GeSn and Silicon (Si) substrate, the defects will generate within the GeSn layer. Currently, thin GeSn acts...

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Bibliographic Details
Main Author: Zhong, Jian
Other Authors: Li King Ho Holden
Format: Final Year Project (FYP)
Language:English
Published: Nanyang Technological University 2021
Subjects:
Online Access:https://hdl.handle.net/10356/150361
_version_ 1826128085894823936
author Zhong, Jian
author2 Li King Ho Holden
author_facet Li King Ho Holden
Zhong, Jian
author_sort Zhong, Jian
collection NTU
description Germanium-tin (Ge0.9Sn0.1) alloy is one of the complementary metal-oxide-semiconductor (CMOS) compatible materials in group-IV of the periodic table. Due to the large lattice mismatch between GeSn and Silicon (Si) substrate, the defects will generate within the GeSn layer. Currently, thin GeSn acts as a direct-band gap for near-mid infrared light source and photodetector. The report will show how to grow a high-quality single-crystalline GeSn (~1 μm) on germanium (Ge) buffer on Si substrate. The GeSn layer has low compression stress (-0.3%). A set of GeSn pedestal waveguide with a width of 1.25 μm has been fabricated. By measured the transmission power of GeSn at 3.74 μm, the results for propagation loss and bending loss are approximated to be 1.81 dB/cm and 0.19 dB/bend, respectively. Using infrared spectrometry, the GeSn waveguide is shown to have a transparency window to be longer than 25 μm.
first_indexed 2024-10-01T07:19:09Z
format Final Year Project (FYP)
id ntu-10356/150361
institution Nanyang Technological University
language English
last_indexed 2024-10-01T07:19:09Z
publishDate 2021
publisher Nanyang Technological University
record_format dspace
spelling ntu-10356/1503612021-05-27T08:21:58Z Formation of germanium (Ge) – based waveguides for infrared application Zhong, Jian Li King Ho Holden Tan, Chuan Seng School of Mechanical and Aerospace Engineering HoldenLi@ntu.edu.sg, TanCS@ntu.edu.sg Engineering::Mechanical engineering Germanium-tin (Ge0.9Sn0.1) alloy is one of the complementary metal-oxide-semiconductor (CMOS) compatible materials in group-IV of the periodic table. Due to the large lattice mismatch between GeSn and Silicon (Si) substrate, the defects will generate within the GeSn layer. Currently, thin GeSn acts as a direct-band gap for near-mid infrared light source and photodetector. The report will show how to grow a high-quality single-crystalline GeSn (~1 μm) on germanium (Ge) buffer on Si substrate. The GeSn layer has low compression stress (-0.3%). A set of GeSn pedestal waveguide with a width of 1.25 μm has been fabricated. By measured the transmission power of GeSn at 3.74 μm, the results for propagation loss and bending loss are approximated to be 1.81 dB/cm and 0.19 dB/bend, respectively. Using infrared spectrometry, the GeSn waveguide is shown to have a transparency window to be longer than 25 μm. Bachelor of Engineering (Mechanical Engineering) 2021-05-27T08:21:57Z 2021-05-27T08:21:57Z 2021 Final Year Project (FYP) Zhong, J. (2021). Formation of germanium (Ge) – based waveguides for infrared application. Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/150361 https://hdl.handle.net/10356/150361 en P-B049 10.1109/JPHOT.2021.3059452 application/pdf Nanyang Technological University
spellingShingle Engineering::Mechanical engineering
Zhong, Jian
Formation of germanium (Ge) – based waveguides for infrared application
title Formation of germanium (Ge) – based waveguides for infrared application
title_full Formation of germanium (Ge) – based waveguides for infrared application
title_fullStr Formation of germanium (Ge) – based waveguides for infrared application
title_full_unstemmed Formation of germanium (Ge) – based waveguides for infrared application
title_short Formation of germanium (Ge) – based waveguides for infrared application
title_sort formation of germanium ge based waveguides for infrared application
topic Engineering::Mechanical engineering
url https://hdl.handle.net/10356/150361
work_keys_str_mv AT zhongjian formationofgermaniumgebasedwaveguidesforinfraredapplication