Study of the effect of forward gate bias stress on the reliability of AlGaN/GaN HEMTs on SI

AlGaN/GaN high electron mobility transistors (HEMTs) have shown promising capabilities for high frequency and high-power applications. As 5G technology and autonomous vehicles become more and more attractive, HEMTs will start to play an increasingly important role in the semiconductor industry. Whil...

Full description

Bibliographic Details
Main Author: Gao, Yu
Other Authors: Gan Chee Lip
Format: Thesis-Doctor of Philosophy
Language:English
Published: Nanyang Technological University 2021
Subjects:
Online Access:https://hdl.handle.net/10356/152654