Electrodeposition of indium tin oxide thin film
A new method for producing indium tin oxide (ITO) thin film by electrodeposition of indium chloride and tin chloride precursors has been achieved in this project. The films were annealed at 500°C for 1h to remove the excess metallic elements to form crystalline ITO thin films. XRD analysis showed ty...
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| フォーマット: | Final Year Project (FYP) |
| 言語: | English |
| 出版事項: |
2009
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| オンライン･アクセス: | http://hdl.handle.net/10356/15383 |