Electrodeposition of indium tin oxide thin film

A new method for producing indium tin oxide (ITO) thin film by electrodeposition of indium chloride and tin chloride precursors has been achieved in this project. The films were annealed at 500°C for 1h to remove the excess metallic elements to form crystalline ITO thin films. XRD analysis showed ty...

詳細記述

書誌詳細
第一著者: Lee, Charlotte Wei Wei.
その他の著者: Wong Chee Cheong
フォーマット: Final Year Project (FYP)
言語:English
出版事項: 2009
主題:
オンライン・アクセス:http://hdl.handle.net/10356/15383