Atomic layer deposition of metallic tri-layer for alloy formation
Research has brought about great interest in the field of thin films and its applications. With the need for increasingly smaller devices, there is an increasing demand for synthesis methods to control and precisely fabricate components and materials. Atomic layer deposition (ALD) has become a topic...
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| Format: | Final Year Project (FYP) |
| Language: | English |
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Nanyang Technological University
2022
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| Online Access: | https://hdl.handle.net/10356/156175 |