Studies of gallium nitride high electron mobility transistors (HEMTs)

Gallium Nitride (GaN) is a Group III/V wide bandgap nitride-based material that offer many unique properties. It not only offers higher breakdown strength, faster switching speed and lower on resistance, it significantly outperforms the traditional silicon-based device. These properties have been...

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Main Author: Tie, Keven Guo Sheng
Other Authors: Ng Geok Ing
Format: Final Year Project (FYP)
Language:English
Published: Nanyang Technological University 2022
Subjects:
Online Access:https://hdl.handle.net/10356/157799
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author Tie, Keven Guo Sheng
author2 Ng Geok Ing
author_facet Ng Geok Ing
Tie, Keven Guo Sheng
author_sort Tie, Keven Guo Sheng
collection NTU
description Gallium Nitride (GaN) is a Group III/V wide bandgap nitride-based material that offer many unique properties. It not only offers higher breakdown strength, faster switching speed and lower on resistance, it significantly outperforms the traditional silicon-based device. These properties have been attracting attention of many engineering scientist and leaders of the commercial semiconductor industry. Also, with its properties, GaN is set to be in the forefront material in both existing and new applications. In recent times, many breakthroughs have been made in producing powerful GaN devices that are never seen in market before because of its wide spectrum of applications. In this report, GaN HEMTs will be further pushed to limits that are never seen before, namely introduction of new materials to the fabrication process, focusing on its compatibility to meet RF technology. Some transistors that are fabricated will be tested and analysed of its performance.
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spelling ntu-10356/1577992023-07-07T19:10:36Z Studies of gallium nitride high electron mobility transistors (HEMTs) Tie, Keven Guo Sheng Ng Geok Ing School of Electrical and Electronic Engineering EGING@ntu.edu.sg Engineering::Electrical and electronic engineering Gallium Nitride (GaN) is a Group III/V wide bandgap nitride-based material that offer many unique properties. It not only offers higher breakdown strength, faster switching speed and lower on resistance, it significantly outperforms the traditional silicon-based device. These properties have been attracting attention of many engineering scientist and leaders of the commercial semiconductor industry. Also, with its properties, GaN is set to be in the forefront material in both existing and new applications. In recent times, many breakthroughs have been made in producing powerful GaN devices that are never seen in market before because of its wide spectrum of applications. In this report, GaN HEMTs will be further pushed to limits that are never seen before, namely introduction of new materials to the fabrication process, focusing on its compatibility to meet RF technology. Some transistors that are fabricated will be tested and analysed of its performance. Bachelor of Engineering (Electrical and Electronic Engineering) 2022-05-23T12:05:54Z 2022-05-23T12:05:54Z 2022 Final Year Project (FYP) Tie, K. G. S. (2022). Studies of gallium nitride high electron mobility transistors (HEMTs). Final Year Project (FYP), Nanyang Technological University, Singapore. https://hdl.handle.net/10356/157799 https://hdl.handle.net/10356/157799 en A2167-211 application/pdf Nanyang Technological University
spellingShingle Engineering::Electrical and electronic engineering
Tie, Keven Guo Sheng
Studies of gallium nitride high electron mobility transistors (HEMTs)
title Studies of gallium nitride high electron mobility transistors (HEMTs)
title_full Studies of gallium nitride high electron mobility transistors (HEMTs)
title_fullStr Studies of gallium nitride high electron mobility transistors (HEMTs)
title_full_unstemmed Studies of gallium nitride high electron mobility transistors (HEMTs)
title_short Studies of gallium nitride high electron mobility transistors (HEMTs)
title_sort studies of gallium nitride high electron mobility transistors hemts
topic Engineering::Electrical and electronic engineering
url https://hdl.handle.net/10356/157799
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