Large-scale fabrication of surface ion traps on a 300 mm glass wafer
Herein, a large-scale fabrication of radio frequency (RF) surface ion traps on a 300 mm glass wafer using a standard foundry process is reported. Established wafer-level packaging process of electroplated Cu with Au finish is used to fabricate the surface electrodes directly on the glass wafer subst...
| Main Authors: | , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2022
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/160357 |
| _version_ | 1826125518998601728 |
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| author | Tao, Jing Likforman, Jean-Pierre Zhao, Peng Li, Hong Yu Henner, Theo Lim, Yu Dian Seit, Wen Wei Guidoni, Luca Tan, Chuan Seng |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Tao, Jing Likforman, Jean-Pierre Zhao, Peng Li, Hong Yu Henner, Theo Lim, Yu Dian Seit, Wen Wei Guidoni, Luca Tan, Chuan Seng |
| author_sort | Tao, Jing |
| collection | NTU |
| description | Herein, a large-scale fabrication of radio frequency (RF) surface ion traps on a 300 mm glass wafer using a standard foundry process is reported. Established wafer-level packaging process of electroplated Cu with Au finish is used to fabricate the surface electrodes directly on the glass wafer substrate. A trap is tested by loading it with laser-cooled 88Sr+ ions. The trap shows a stable operation with RF amplitudes in the range of 100–250 V at 33 MHz frequency. The ion lifetime is on the order of 30 min with laser cooling with a vacuum chamber pressure of ≈5 × 10−11 mbar. These results demonstrate the potential of large-size foundry glass substrates to realize scalable and integratable trapped ion-based quantum devices. |
| first_indexed | 2024-10-01T06:37:39Z |
| format | Journal Article |
| id | ntu-10356/160357 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:37:39Z |
| publishDate | 2022 |
| record_format | dspace |
| spelling | ntu-10356/1603572022-07-20T01:26:15Z Large-scale fabrication of surface ion traps on a 300 mm glass wafer Tao, Jing Likforman, Jean-Pierre Zhao, Peng Li, Hong Yu Henner, Theo Lim, Yu Dian Seit, Wen Wei Guidoni, Luca Tan, Chuan Seng School of Electrical and Electronic Engineering Engineering::Electrical and electronic engineering Glass Ion Traps Large-Scale Fabrication Herein, a large-scale fabrication of radio frequency (RF) surface ion traps on a 300 mm glass wafer using a standard foundry process is reported. Established wafer-level packaging process of electroplated Cu with Au finish is used to fabricate the surface electrodes directly on the glass wafer substrate. A trap is tested by loading it with laser-cooled 88Sr+ ions. The trap shows a stable operation with RF amplitudes in the range of 100–250 V at 33 MHz frequency. The ion lifetime is on the order of 30 min with laser cooling with a vacuum chamber pressure of ≈5 × 10−11 mbar. These results demonstrate the potential of large-size foundry glass substrates to realize scalable and integratable trapped ion-based quantum devices. Agency for Science, Technology and Research (A*STAR) The work was financially supported by A*STAR Quantum Technology for Engineering (A1685b0005). 2022-07-20T01:26:14Z 2022-07-20T01:26:14Z 2021 Journal Article Tao, J., Likforman, J., Zhao, P., Li, H. Y., Henner, T., Lim, Y. D., Seit, W. W., Guidoni, L. & Tan, C. S. (2021). Large-scale fabrication of surface ion traps on a 300 mm glass wafer. Physica Status Solidi (B), 258(7), 2000589-. https://dx.doi.org/10.1002/pssb.202000589 0370-1972 https://hdl.handle.net/10356/160357 10.1002/pssb.202000589 2-s2.0-85106221841 7 258 2000589 en A1685b0005 Physica Status Solidi (B) © 2021 Wiley-VCH GmbH. All rights reserved. |
| spellingShingle | Engineering::Electrical and electronic engineering Glass Ion Traps Large-Scale Fabrication Tao, Jing Likforman, Jean-Pierre Zhao, Peng Li, Hong Yu Henner, Theo Lim, Yu Dian Seit, Wen Wei Guidoni, Luca Tan, Chuan Seng Large-scale fabrication of surface ion traps on a 300 mm glass wafer |
| title | Large-scale fabrication of surface ion traps on a 300 mm glass wafer |
| title_full | Large-scale fabrication of surface ion traps on a 300 mm glass wafer |
| title_fullStr | Large-scale fabrication of surface ion traps on a 300 mm glass wafer |
| title_full_unstemmed | Large-scale fabrication of surface ion traps on a 300 mm glass wafer |
| title_short | Large-scale fabrication of surface ion traps on a 300 mm glass wafer |
| title_sort | large scale fabrication of surface ion traps on a 300 mm glass wafer |
| topic | Engineering::Electrical and electronic engineering Glass Ion Traps Large-Scale Fabrication |
| url | https://hdl.handle.net/10356/160357 |
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