Stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets exposed to high-energy ions and reactive atomic oxygen

Stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets exposed to high-energy ions and reactive atomic oxygen

Stability of advanced functional materials subjected to extreme conditions involving ion bombardment, radiation, or reactive chemicals is crucial for diverse applications. Here we demonstrate the excellent stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets (hBNNS) expo...

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Bibliographic Details
Main Authors: Huang, Shiyong, Ng, Zhi Kai, Li, Hongling, Chaturvedi, Apoorva, Lim, Mark Jian Wei, Tay, Roland Yingjie, Teo, Edwin Hang Tong, Xu, Shuyan, Ostrikov, Kostya Ken, Tsang, Siu Hon
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2023
Subjects:
Engineering::Materials
Inductively Coupled Plasmas
Chemical Vapor Deposition
Online Access:https://hdl.handle.net/10356/165129

Internet

https://hdl.handle.net/10356/165129

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