Antireflective GaN nanoridge texturing by metal-assisted chemical etching via a thermally dewetted Pt catalyst network for highly responsive ultraviolet photodiodes

Antireflective (AR) surface texturing is a feasible way to boost the light absorption of photosensitive materials and devices. As a plasma-free etching method, metal-assisted chemical etching (MacEtch) has been employed for fabricating GaN AR surface texturing. However, the poor etching efficiency o...

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书目详细资料
Main Authors: Liao, Yikai, Kim, You Jin, Lai, Junyu, Seo, Jung-Hun, Kim, Munho
其他作者: School of Electrical and Electronic Engineering
格式: Journal Article
语言:English
出版: 2023
主题:
在线阅读:https://hdl.handle.net/10356/165824