Deep-learning based IC die identification and die surface defect inspection

Much effort is needed when detecting faults in semiconductors during the manufacturing process. With the rise of artificial intelligence to enhance processes, many would wonder how it is incorporated with semiconductor technologies. However, as a substantial amount of training data is required for t...

詳細記述

書誌詳細
第一著者: Teo, Kai Yu
その他の著者: Qian Kemao
フォーマット: Final Year Project (FYP)
言語:English
出版事項: Nanyang Technological University 2023
主題:
オンライン・アクセス:https://hdl.handle.net/10356/166704

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