Thin film fabrication for optimal reflectivity coatings at 1064nm

In collaboration with Defence Science Organization, this project aim to achieve optimal reflectivity at 1064nm using Filter Cathodic Vacuum Arc (FCVA) technique. It involved fabrication of single and multi-layer thin film coating using Silicon and Titanium target. In this project, depositions are do...

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Detalhes bibliográficos
Autor principal: Xiao, Zed Zhiqiang
Outros Autores: Tay Beng Kang
Formato: Final Year Project (FYP)
Idioma:English
Publicado em: 2009
Assuntos:
Acesso em linha:http://hdl.handle.net/10356/16686