Chemical mechanical polishing of germanium selectively grown on silicon

Chemical mechanical polishing of germanium selectively grown on silicon

This report reviews the importance of the Chemical and Mechanical Planarization (CMP) process for photonics applications and discusses the various factors that affect the quality of CMP, and how to achieve optimality of the slurry recipe. Germanium-on-silicon (GOS) waveguides are fabricated for t...

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Bibliographic Details
Main Author: Tan, Bryan Yue Han
Other Authors: Tan Chuan Seng
Format: Final Year Project (FYP)
Language:English
Published: Nanyang Technological University 2023
Subjects:
Engineering::Electrical and electronic engineering::Nanoelectronics
Engineering::Materials::Microelectronics and semiconductor materials
Online Access:https://hdl.handle.net/10356/167639

Internet

https://hdl.handle.net/10356/167639

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