Chemical mechanical polishing of germanium selectively grown on silicon

This report reviews the importance of the Chemical and Mechanical Planarization (CMP) process for photonics applications and discusses the various factors that affect the quality of CMP, and how to achieve optimality of the slurry recipe. Germanium-on-silicon (GOS) waveguides are fabricated for t...

Olles dieđut

Bibliográfalaš dieđut
Váldodahkki: Tan, Bryan Yue Han
Eará dahkkit: Tan Chuan Seng
Materiálatiipa: Final Year Project (FYP)
Giella:English
Almmustuhtton: Nanyang Technological University 2023
Fáttát:
Liŋkkat:https://hdl.handle.net/10356/167639