Broad-energy oxygen ion implantation controlled magnetization dynamics in CoFeTaZr

Broad-energy oxygen ion implantation controlled magnetization dynamics in CoFeTaZr

In this paper, a novel pulsed broad energy spectrum ion-implantation technique, using the dense plasma focus device (DPF), for uniform oxygen-ion doping along the thickness of a ~250 nm thick magnetic CoFeTaZr layer is investigated. A new operational regime of the dense plasma focus – the off-focus...

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Bibliographic Details
Main Authors: Vas, Joseph Vimal, Medwal, Rohit, Chaudhuri, Ushnish, Mishra, Mayank, Chaurasiya, Avinash, Mahendiran, Ramanathan, Piramanayagam, S. N., Rawat, Rajdeep Singh, Lee, Paul Choon Keat
Other Authors: School of Physical and Mathematical Sciences
Format: Journal Article
Language:English
Published: 2023
Subjects:
Science::Physics
Ion Implantation
Magnetization Dynamics
Online Access:https://hdl.handle.net/10356/167879

Internet

https://hdl.handle.net/10356/167879

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