Study of the mask-less lithography system for high resolution pattern and 3D structure of SU-8 negative photoresist
With the increasing demand for miniaturized devices with complex functionalities, the field of microfabrication has made significant advancements. Lithography technology plays a crucial role in defining microscale features on substrates. SU-8, an epoxy-based negative photoresist, is widely used due...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
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Nanyang Technological University
2024
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| Online Access: | https://hdl.handle.net/10356/180163 |