Applications and precision studies of positive photoresists in photolithography
This paper reviews the evolution of photolithography, from its origins with Senefelder to modern technologies such as EUV, DUV, and EBL. Photolithography, a complex multidisciplinary field, has continually advanced, with core factors influencing resolution improvement identified through the st...
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| Format: | Thesis-Master by Coursework |
| Language: | English |
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Nanyang Technological University
2025
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| Online Access: | https://hdl.handle.net/10356/182653 |