Silicon photonics process simplification - grating mask reduction

In Silicon Photonics, grating couplers are used as a surface-coupling optical component for guiding light in a preferential direction for process control. However, edge couplers can achieve rather high coupling efficiency, broad bandwidth, and polarization independence, which are normally used...

Full description

Bibliographic Details
Main Author: Li, Aolin
Other Authors: Tang Xiaohong
Format: Thesis-Master by Coursework
Language:English
Published: Nanyang Technological University 2025
Subjects:
Online Access:https://hdl.handle.net/10356/182802
_version_ 1826131585808728064
author Li, Aolin
author2 Tang Xiaohong
author_facet Tang Xiaohong
Li, Aolin
author_sort Li, Aolin
collection NTU
description In Silicon Photonics, grating couplers are used as a surface-coupling optical component for guiding light in a preferential direction for process control. However, edge couplers can achieve rather high coupling efficiency, broad bandwidth, and polarization independence, which are normally used in real product design. Therefore, it is critical to develop new grating couplers by reducing grating mask and process, used for wafer level optical test to get comparable wave guide propagation loss. The process simplification should not impact product function. In this thesis, new type grating couplers for both C-band(1550nm) and O-band(1310nm) are designed to achieve comparable coupling loss with simplified process to existing baseline. Wave guide propagation loss can be tested comparably to baseline by process control monitoring structure with new type grating couplers and simplified process.
first_indexed 2025-03-09T15:39:51Z
format Thesis-Master by Coursework
id ntu-10356/182802
institution Nanyang Technological University
language English
last_indexed 2025-03-09T15:39:51Z
publishDate 2025
publisher Nanyang Technological University
record_format dspace
spelling ntu-10356/1828022025-02-28T15:48:50Z Silicon photonics process simplification - grating mask reduction Li, Aolin Tang Xiaohong School of Electrical and Electronic Engineering Advanced Micro Foundry EXHTang@ntu.edu.sg Physics Grating coupler Silicon photonics In Silicon Photonics, grating couplers are used as a surface-coupling optical component for guiding light in a preferential direction for process control. However, edge couplers can achieve rather high coupling efficiency, broad bandwidth, and polarization independence, which are normally used in real product design. Therefore, it is critical to develop new grating couplers by reducing grating mask and process, used for wafer level optical test to get comparable wave guide propagation loss. The process simplification should not impact product function. In this thesis, new type grating couplers for both C-band(1550nm) and O-band(1310nm) are designed to achieve comparable coupling loss with simplified process to existing baseline. Wave guide propagation loss can be tested comparably to baseline by process control monitoring structure with new type grating couplers and simplified process. Master's degree 2025-02-27T05:16:48Z 2025-02-27T05:16:48Z 2024 Thesis-Master by Coursework Li, A. (2024). Silicon photonics process simplification - grating mask reduction. Master's thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/182802 https://hdl.handle.net/10356/182802 en application/pdf Nanyang Technological University
spellingShingle Physics
Grating coupler
Silicon photonics
Li, Aolin
Silicon photonics process simplification - grating mask reduction
title Silicon photonics process simplification - grating mask reduction
title_full Silicon photonics process simplification - grating mask reduction
title_fullStr Silicon photonics process simplification - grating mask reduction
title_full_unstemmed Silicon photonics process simplification - grating mask reduction
title_short Silicon photonics process simplification - grating mask reduction
title_sort silicon photonics process simplification grating mask reduction
topic Physics
Grating coupler
Silicon photonics
url https://hdl.handle.net/10356/182802
work_keys_str_mv AT liaolin siliconphotonicsprocesssimplificationgratingmaskreduction