Silicon photonics process simplification - grating mask reduction
In Silicon Photonics, grating couplers are used as a surface-coupling optical component for guiding light in a preferential direction for process control. However, edge couplers can achieve rather high coupling efficiency, broad bandwidth, and polarization independence, which are normally used...
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Format: | Thesis-Master by Coursework |
Language: | English |
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Nanyang Technological University
2025
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Online Access: | https://hdl.handle.net/10356/182802 |
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author | Li, Aolin |
author2 | Tang Xiaohong |
author_facet | Tang Xiaohong Li, Aolin |
author_sort | Li, Aolin |
collection | NTU |
description | In Silicon Photonics, grating couplers are used as a surface-coupling optical
component for guiding light in a preferential direction for process control. However,
edge couplers can achieve rather high coupling efficiency, broad bandwidth, and
polarization independence, which are normally used in real product design. Therefore,
it is critical to develop new grating couplers by reducing grating mask and process,
used for wafer level optical test to get comparable wave guide propagation loss. The
process simplification should not impact product function. In this thesis, new type
grating couplers for both C-band(1550nm) and O-band(1310nm) are designed to
achieve comparable coupling loss with simplified process to existing baseline. Wave
guide propagation loss can be tested comparably to baseline by process control
monitoring structure with new type grating couplers and simplified process. |
first_indexed | 2025-03-09T15:39:51Z |
format | Thesis-Master by Coursework |
id | ntu-10356/182802 |
institution | Nanyang Technological University |
language | English |
last_indexed | 2025-03-09T15:39:51Z |
publishDate | 2025 |
publisher | Nanyang Technological University |
record_format | dspace |
spelling | ntu-10356/1828022025-02-28T15:48:50Z Silicon photonics process simplification - grating mask reduction Li, Aolin Tang Xiaohong School of Electrical and Electronic Engineering Advanced Micro Foundry EXHTang@ntu.edu.sg Physics Grating coupler Silicon photonics In Silicon Photonics, grating couplers are used as a surface-coupling optical component for guiding light in a preferential direction for process control. However, edge couplers can achieve rather high coupling efficiency, broad bandwidth, and polarization independence, which are normally used in real product design. Therefore, it is critical to develop new grating couplers by reducing grating mask and process, used for wafer level optical test to get comparable wave guide propagation loss. The process simplification should not impact product function. In this thesis, new type grating couplers for both C-band(1550nm) and O-band(1310nm) are designed to achieve comparable coupling loss with simplified process to existing baseline. Wave guide propagation loss can be tested comparably to baseline by process control monitoring structure with new type grating couplers and simplified process. Master's degree 2025-02-27T05:16:48Z 2025-02-27T05:16:48Z 2024 Thesis-Master by Coursework Li, A. (2024). Silicon photonics process simplification - grating mask reduction. Master's thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/182802 https://hdl.handle.net/10356/182802 en application/pdf Nanyang Technological University |
spellingShingle | Physics Grating coupler Silicon photonics Li, Aolin Silicon photonics process simplification - grating mask reduction |
title | Silicon photonics process simplification - grating mask reduction |
title_full | Silicon photonics process simplification - grating mask reduction |
title_fullStr | Silicon photonics process simplification - grating mask reduction |
title_full_unstemmed | Silicon photonics process simplification - grating mask reduction |
title_short | Silicon photonics process simplification - grating mask reduction |
title_sort | silicon photonics process simplification grating mask reduction |
topic | Physics Grating coupler Silicon photonics |
url | https://hdl.handle.net/10356/182802 |
work_keys_str_mv | AT liaolin siliconphotonicsprocesssimplificationgratingmaskreduction |