Rapid thermal annealing for ultra-shallow junction in deep submicron CMOS integrated circuits
In this MSC dissertation, the focus of the study has been on the effect of critical parameters of rapid thermal anneal on shallow implants for ultra-shallow junction formation. Spike anneal was found to be more effective than soak anneal for ultra-shallow function formation.
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| Format: | Thesis |
| Language: | English |
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2009
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| Online Access: | http://hdl.handle.net/10356/19276 |