Fabrication and characterization of low-temperature poly-si TFTs for AMLCD
The objective of this project was to develop a low temperature poly-Si TFT fabrication process based on the existing clean room facilities at Micro-Fabrication Laboratory in NTU. Low temperature poly-Si TFTs were mainly used for active matrix display applications.
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| Other Authors: | |
| Format: | Thesis |
| Language: | English |
| Published: |
2009
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| Online Access: | http://hdl.handle.net/10356/19343 |
| _version_ | 1811686883226288128 |
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| author | Ong, Gim Chye |
| author2 | Sun Xiaowei |
| author_facet | Sun Xiaowei Ong, Gim Chye |
| author_sort | Ong, Gim Chye |
| collection | NTU |
| description | The objective of this project was to develop a low temperature poly-Si TFT fabrication process based on the existing clean room facilities at Micro-Fabrication Laboratory in NTU. Low temperature poly-Si TFTs were mainly used for active matrix display applications. |
| first_indexed | 2024-10-01T05:07:29Z |
| format | Thesis |
| id | ntu-10356/19343 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T05:07:29Z |
| publishDate | 2009 |
| record_format | dspace |
| spelling | ntu-10356/193432023-07-04T15:25:19Z Fabrication and characterization of low-temperature poly-si TFTs for AMLCD Ong, Gim Chye Sun Xiaowei School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering The objective of this project was to develop a low temperature poly-Si TFT fabrication process based on the existing clean room facilities at Micro-Fabrication Laboratory in NTU. Low temperature poly-Si TFTs were mainly used for active matrix display applications. Master of Philosophy (EEE) 2009-12-10T06:19:27Z 2009-12-10T06:19:27Z 2001 2001 Thesis http://hdl.handle.net/10356/19343 en 133 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering Ong, Gim Chye Fabrication and characterization of low-temperature poly-si TFTs for AMLCD |
| title | Fabrication and characterization of low-temperature poly-si TFTs for AMLCD |
| title_full | Fabrication and characterization of low-temperature poly-si TFTs for AMLCD |
| title_fullStr | Fabrication and characterization of low-temperature poly-si TFTs for AMLCD |
| title_full_unstemmed | Fabrication and characterization of low-temperature poly-si TFTs for AMLCD |
| title_short | Fabrication and characterization of low-temperature poly-si TFTs for AMLCD |
| title_sort | fabrication and characterization of low temperature poly si tfts for amlcd |
| topic | DRNTU::Engineering::Electrical and electronic engineering |
| url | http://hdl.handle.net/10356/19343 |
| work_keys_str_mv | AT onggimchye fabricationandcharacterizationoflowtemperaturepolysitftsforamlcd |