A steady-state RF inductively coupled plasma source for plasma processing
This project aims at developing the low-frequency, uniform and high density plasma source for materials processing. The uniform, large (32 cm in diameter), high-density plasma source capable of rapid processign of large substrates has been developed and investigated both theoretically and experimen...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Research Report |
| Published: |
2008
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| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/2741 |