Development of copper metallization for Deep Submicron Integrated Circuits (DSICs)
The development of copper metallization for deep submicron integrated circuits (DSICs) was a project jointly funded by the Ministry of Education (MoE) and the Agency for Science Technology and Research (A*STAR). Being a very broad based project, the report is deliberately divided into 3 parts. Each...
Hoofdauteurs: | , , |
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Formaat: | Research Report |
Gepubliceerd in: |
2008
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Onderwerpen: | |
Online toegang: | http://hdl.handle.net/10356/2896 |