Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs

Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs

This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner cha...

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Bibliographic Details
Main Author: Ranjan Khurana
Other Authors: School of Electrical and Electronic Engineering
Format: Thesis
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
Online Access:http://hdl.handle.net/10356/3176

Internet

http://hdl.handle.net/10356/3176

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