Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs

This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner cha...

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書目詳細資料
主要作者: Ranjan Khurana
其他作者: School of Electrical and Electronic Engineering
格式: Thesis
出版: 2008
主題:
在線閱讀:http://hdl.handle.net/10356/3176