Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner cha...
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/3176 |
| Summary: | This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements. |
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