Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs
This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner cha...
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/3176 |
| _version_ | 1826112377690521600 |
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| author | Ranjan Khurana |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Ranjan Khurana |
| author_sort | Ranjan Khurana |
| collection | NTU |
| description | This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements. |
| first_indexed | 2024-10-01T03:06:00Z |
| format | Thesis |
| id | ntu-10356/3176 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T03:06:00Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/31762023-07-04T16:40:12Z Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs Ranjan Khurana School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits This thesis presents how printing performance at llOnm technology node with KrF (248nm) lithography can be impaired if scanner lens aberrations are not contained within optimal levels. Lens aberrations drift over a period of time and need continuous monitoring and tuning to ensure stable Scanner characteristics. Second portion of the dissertation proposes a new method of illumination sigma matching for tools from different vendors which have different optical elements. Master of Science (Microelectronics) 2008-09-17T09:24:01Z 2008-09-17T09:24:01Z 2006 2006 Thesis http://hdl.handle.net/10356/3176 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Ranjan Khurana Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs |
| title | Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs |
| title_full | Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs |
| title_fullStr | Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs |
| title_full_unstemmed | Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs |
| title_short | Effect of lens aberrations and illumination imperfections in low k1 lithography of DRAMs |
| title_sort | effect of lens aberrations and illumination imperfections in low k1 lithography of drams |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits |
| url | http://hdl.handle.net/10356/3176 |
| work_keys_str_mv | AT ranjankhurana effectoflensaberrationsandilluminationimperfectionsinlowk1lithographyofdrams |