Characterization of deep trench etch recipe

Characterization of deep trench etch recipe

This thesis presents the Design of Experiments (DOEs) done on deep trench etch recipe using Applied Material's decoupled plasma source reactor, DPS 5200 Centura II Deep Trench Etcher, intended for use in High Voltage Bipolar Transistor (HX) process development as isolation in X-Fab Semiconducto...

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Bibliographic Details
Main Author: Tay, Chin Tiong.
Other Authors: Prasad, Krishnamachar
Format: Thesis
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:http://hdl.handle.net/10356/3424

Internet

http://hdl.handle.net/10356/3424

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