Rare earth oxide for nanoelectronics
This project primarily focus is on investigating whether the introduction of a passivation layer would allow for the formation of a more uniform coating on the Si substrate surface. The thin films are used in various devices such as metal-oxide-semiconductor (CMOS) transistors. The scaling down of...
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| Format: | Final Year Project (FYP) |
| Language: | English |
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2010
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| Online Access: | http://hdl.handle.net/10356/36178 |