Characterization of Si-based materials for surface micromachined microbolometer applications
In this thesis, the integration of CMOS devices with Si-based microbolometer sensor on the same silicon chip was studied. Silicon based material, Poly-Si and Poly-SiGe layers were deposited as the Infra-Red (IR) sensing film as well as the CMOS gate electrode. Microbolometer test structures and CMOS...
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Format: | Thesis |
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2008
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Online Access: | http://hdl.handle.net/10356/3967 |