Novel transistor structures for future deep submicron MOS applications
Bulk silicon CMOS processing is reaching the limits in device scaling and fabrication. Silicon-an-Insulator (Sal) technology provides an alternative. It not only allows better scalability but also a solution to low power and high performance applications for next generation CMOS devices. Fully deple...
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| Format: | Thesis |
| Language: | English |
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2010
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| Online Access: | https://hdl.handle.net/10356/41403 |