Laser annealing of semiconductor materials for future electron device application

Laser annealing of semiconductor materials for future electron device application

Laser annealing (LA) is an emerging technique that has the potential to be incorporated into the device fabrication process in the near future. The unique characteristics of LA that are not found in the conventional thermal annealing methods have gained substantial attraction for applications to the...

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Bibliographic Details
Main Author: Ong, Chio Yin.
Other Authors: Pey Kin Leong
Format: Thesis
Language:English
Published: 2011
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:http://hdl.handle.net/10356/43999

Internet

http://hdl.handle.net/10356/43999

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