Residual stress in thin film
The objective of this report is to observe the trend of residual stress with respect to (i) Substrate Bias applied during pre-deposition substrate treatment and (ii) film thickness of (Ti,Al)(N,C) coating material on High-Speed Steel (HSS) substrate. The parameters varied from (i) 0-300W and (ii) 0....
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| Format: | Final Year Project (FYP) |
| Language: | English |
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2011
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| Online Access: | http://hdl.handle.net/10356/44486 |