Development of silicon carbide thin films for optoelectronic device applications

Development of silicon carbide thin films for optoelectronic device applications

In this project, the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique has been used to deposit amorphous (a-SiC:H) and microcrystalline (mc-SiC3-I) films for characterisation of their optical, electrical and structural properties using transmittance/reflectance measuremen...

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Detalhes bibliográficos
Autor principal: Ji, Rong
Outros Autores: Yoon, Soon Fatt
Formato: Tese
Publicado em: 2008
Assuntos:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Acesso em linha:http://hdl.handle.net/10356/4461

Internet

http://hdl.handle.net/10356/4461

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