Influence of bias power and doping of Si on hardness and toughness of CrAlN
This project focused on the study of the influence of bias power and concentration of doped silicon on the hardness and toughness of CrAlN thin films. Reactive magnetron sputtering was used to prepare CrAlN and CrAlSiN thin films by sputtering the CrAl target and co-sputtering CrAl/Si targets respec...
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| Format: | Final Year Project (FYP) |
| Language: | English |
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2011
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| Online Access: | http://hdl.handle.net/10356/46149 |