Influence of bias power and doping of Si on hardness and toughness of CrAlN
This project focused on the study of the influence of bias power and concentration of doped silicon on the hardness and toughness of CrAlN thin films. Reactive magnetron sputtering was used to prepare CrAlN and CrAlSiN thin films by sputtering the CrAl target and co-sputtering CrAl/Si targets respec...
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| Format: | Final Year Project (FYP) |
| Language: | English |
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2011
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| Online Access: | http://hdl.handle.net/10356/46149 |
| _version_ | 1811680180679213056 |
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| author | Chan, Kristel Hui Yan. |
| author2 | Sam Zhang Shanyong |
| author_facet | Sam Zhang Shanyong Chan, Kristel Hui Yan. |
| author_sort | Chan, Kristel Hui Yan. |
| collection | NTU |
| description | This project focused on the study of the influence of bias power and concentration of doped silicon on the hardness and toughness of CrAlN thin films. Reactive magnetron sputtering was used to prepare CrAlN and CrAlSiN thin films by sputtering the CrAl target and co-sputtering CrAl/Si targets respectively in a gas mixture of argon and nitrogen. There were two parts in this study. For CrAlN thin films, the effect of bias power was studied by varying the degrees of bias power during sputtering. For CrAlSiN thin films, the effect of silicon concentration was studied by doping different amounts of silicon contents. |
| first_indexed | 2024-10-01T03:20:57Z |
| format | Final Year Project (FYP) |
| id | ntu-10356/46149 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T03:20:57Z |
| publishDate | 2011 |
| record_format | dspace |
| spelling | ntu-10356/461492023-03-04T19:01:52Z Influence of bias power and doping of Si on hardness and toughness of CrAlN Chan, Kristel Hui Yan. Sam Zhang Shanyong School of Mechanical and Aerospace Engineering DRNTU::Engineering This project focused on the study of the influence of bias power and concentration of doped silicon on the hardness and toughness of CrAlN thin films. Reactive magnetron sputtering was used to prepare CrAlN and CrAlSiN thin films by sputtering the CrAl target and co-sputtering CrAl/Si targets respectively in a gas mixture of argon and nitrogen. There were two parts in this study. For CrAlN thin films, the effect of bias power was studied by varying the degrees of bias power during sputtering. For CrAlSiN thin films, the effect of silicon concentration was studied by doping different amounts of silicon contents. Bachelor of Engineering (Mechanical Engineering) 2011-06-29T06:36:28Z 2011-06-29T06:36:28Z 2011 2011 Final Year Project (FYP) http://hdl.handle.net/10356/46149 en Nanyang Technological University 72 p. application/pdf |
| spellingShingle | DRNTU::Engineering Chan, Kristel Hui Yan. Influence of bias power and doping of Si on hardness and toughness of CrAlN |
| title | Influence of bias power and doping of Si on hardness and toughness of CrAlN |
| title_full | Influence of bias power and doping of Si on hardness and toughness of CrAlN |
| title_fullStr | Influence of bias power and doping of Si on hardness and toughness of CrAlN |
| title_full_unstemmed | Influence of bias power and doping of Si on hardness and toughness of CrAlN |
| title_short | Influence of bias power and doping of Si on hardness and toughness of CrAlN |
| title_sort | influence of bias power and doping of si on hardness and toughness of craln |
| topic | DRNTU::Engineering |
| url | http://hdl.handle.net/10356/46149 |
| work_keys_str_mv | AT chankristelhuiyan influenceofbiaspoweranddopingofsionhardnessandtoughnessofcraln |