Study of copper diffusion in tantalum based barrier materials

This thesis presents our findings on Cu diffusion into different potential barrier layers.

Bibliographic Details
Main Author:	Loh, Seow Wee.
Other Authors:	Zhang, Dao Hua
Format:	Thesis
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Online Access:	http://hdl.handle.net/10356/4794

Internet

http://hdl.handle.net/10356/4794