Study of copper diffusion in tantalum based barrier materials
This thesis presents our findings on Cu diffusion into different potential barrier layers.
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| Other Authors: | |
| Format: | Thesis |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4794 |
| _version_ | 1826127549314367488 |
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| author | Loh, Seow Wee. |
| author2 | Zhang, Dao Hua |
| author_facet | Zhang, Dao Hua Loh, Seow Wee. |
| author_sort | Loh, Seow Wee. |
| collection | NTU |
| description | This thesis presents our findings on Cu diffusion into different potential barrier layers. |
| first_indexed | 2024-10-01T07:10:23Z |
| format | Thesis |
| id | ntu-10356/4794 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T07:10:23Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/47942023-07-04T16:02:12Z Study of copper diffusion in tantalum based barrier materials Loh, Seow Wee. Zhang, Dao Hua School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials This thesis presents our findings on Cu diffusion into different potential barrier layers. Doctor of Philosophy (EEE) 2008-09-17T09:58:49Z 2008-09-17T09:58:49Z 2004 2004 Thesis http://hdl.handle.net/10356/4794 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials Loh, Seow Wee. Study of copper diffusion in tantalum based barrier materials |
| title | Study of copper diffusion in tantalum based barrier materials |
| title_full | Study of copper diffusion in tantalum based barrier materials |
| title_fullStr | Study of copper diffusion in tantalum based barrier materials |
| title_full_unstemmed | Study of copper diffusion in tantalum based barrier materials |
| title_short | Study of copper diffusion in tantalum based barrier materials |
| title_sort | study of copper diffusion in tantalum based barrier materials |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials |
| url | http://hdl.handle.net/10356/4794 |
| work_keys_str_mv | AT lohseowwee studyofcopperdiffusionintantalumbasedbarriermaterials |