Carbon films deposition by filtered cathodic vacuum arc technique
Thin carbon films have been deposited by filtered cathode vacuum arc technique and a low bias voltage power supply. The substrate bias voltage ranged from -80 to -400V. It is important for thin films to have low internal stress and good adhesive properties for any applications. The results ascertain...
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| Format: | Research Report |
| Idioma: | English |
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2012
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| Accés en línia: | http://hdl.handle.net/10356/48031 |