Power MOSFET yield improvement through the improvement and refinement of epitaxy process

The work involved in this project is yield improvement of Power MOSFET (PMOS) wafers manufactured in STMicroelectronics. The yield improvement was achieved through the improvement and refinement of Epitaxy process.

Podrobná bibliografie
Hlavní autor: Ng, Kin Meng.
Další autoři: Prasad, Krishnamachar
Médium: Diplomová práce
Vydáno: 2008
Témata:
On-line přístup:http://hdl.handle.net/10356/4954