Improvement on the uniformity and deviation of structured patterns for surface acoustic wave filters
This project is carried out with the main purpose of improving line-width uniformity and deviation across each wafer through optimization of the photolithography processes. In order to remain price competitive in the chip market, this project is also aimed at reducing production costs.
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/4999 |