Effect of stress migration on electromigration for nano scale advanced interconnects

The interconnect system is a significant part of the integrated circuit because of its function to connect millions of transistors, and routing signals into and out of the chip. Therefore, investigating its reliability is a priority for the industry to ensure that the chip lifetime will meet the req...

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Bibliographic Details
Main Author: Anson Heryanto
Other Authors: Pey Kin Leong
Format: Thesis
Language:English
Published: 2012
Subjects:
Online Access:https://hdl.handle.net/10356/50271