Study of VIA etching for sub-micron device fabrication

Via represents the weakest link in multilevel metallisation for IC devices and oxide etching is inherent in the via opening step. Because of higher bond energies, oxide etching typically uses aggressive ion-enhanced, fluorocarbon-based plasma systems. It relies on the competing influences of polymer...

Full description

Bibliographic Details
Main Author: Ho, Chiew Nyuk.
Other Authors: Higelin, Gerald
Format: Thesis
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/5055