Nanometric material removal using electrokinetic phenomenon

Material removal at the sub-micron level has been a topic of interest in the past few years, particularly with respect to the fabrication of miniaturized devices. While numerous techniques have been developed and refined from their larger meso-scale counterparts (e.g. polishing), most have inherent...

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Hlavní autor: Leo, Cheng Seng
Další autoři: Yang Chun, Charles
Médium: Diplomová práce
Jazyk:English
Vydáno: 2012
Témata:
On-line přístup:https://hdl.handle.net/10356/50630